LiAr A2Π-X2Σ DIFFUSE EMISSION EXCITED BY Ar+ LASER LINES

ZHANG LI-MIN,WEI XUN-BIN,XIA YU-XING,ZHANG YUN-SHENG,GENG YU-ZHEN,WANG HUI
DOI: https://doi.org/10.7498/aps.41.740
1992-01-01
Abstract:Excited by Ar+ laser lines of 457.9, 476.5,496.5, 514.5nm, the 650-760nm diffuse emission of A2Π-X2Σ lor Van der Waal's molecular LiAr has been observed in a lithium heat-pipe oven with Ar gas. The dynamics of this emission is discussed.
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