Abstract:In this study, we demonstrate the enhancement of the electrochromic performance of tungsten oxide (WO3) by crystal network topology modification. This is achieved by constructing various crystalline morphologies and patterns of the films. Different mesoscopic crystalline networks of WO3 were acquired on transparent conducting fluorine-doped tin oxide (FTO) by a crystal-seed-assisted hydrothermal process. The modification of the crystal network topology and crystal growth habit of WO3 films was achieved by adding different concentrations of oxalic acid and HCl, and controlling the growth time. The influence of the topological patterns on the corresponding electrochromic performance of WO3 films was examined by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and in situ reflectance spectroscopy. It follows that four different topological patterns of WO3 microstructures, namely random "rocks" of the seed layers, micro-urchin, small peony, and blooming peony were obtained by adding different concentrations of oxalic acid and hydrochloric acid. It is found that pH and oxalic acid are both the key modifying factors of the habit and topology of the crystal networks. Consequently, the urchin-like pattern gives rise to a high efficiency in optical modulation and coloration due to its similarity to micro-sized antennas, which may facilitate the emission and absorption of charged particles and electrochemical reactions at the WO3 surfaces.

Magnetron Sputtered WOx Film: Process Vs Electrochromic Properties and Structure

Magnetron sputtered amorphous tungsten oxide electrochromic film

Electrochromic Properties of WOx -Ti Films

Effect of Argon to Oxygen Ratio on the Properties of Tungsten Oxide Films Prepared by Direct Current Reactive Magnetron Sputtering

Improvement of Electrochromic Performance by Embedding ITO Nanocrystals in Amorphous WO3 Film

Study on Electrochromic Performances of Amorphous WO3 Films

Electrochromic Properties of WO<sub>3</sub> Thin Films Deposited on ITO/PET Substrates by Glancing Angle Magnetron Sputtering

Effect of oxygen pressure on properties of WOx thin films deposited on soft substrate

Electrochromic properties and mechanism of crystalline WO3 films

Enhanced Electrochromic Performance of Macroporous WO3 Films Formed by Anodic Oxidation of DC-sputtered Tungsten Layers

Study on the Ion Conduct Properties of TaOx Film by Magnetron Sputtering Method

Optical Characterization of the Coloration Process in Electrochromic Amorphous and Crystalline Wo3 Films by Spectroscopic Ellipsometry

Microstructure and infrared reflectance modulation properties in DC-sputtered tungsten oxide films

Optical Characterization and Electrochemical Behavior of Electrochromic Windows Using Magnetron Sputter Deposition Tungsten Oxide and (1-X) WO 3 Xtio 2 Thin Films

Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation

Electrochromic Property And Mechanism Of Niox Film Fabricated By Dc Sputtering

Effect of sputtering pressure and oxygen content on the electrochromic properties of NiO films by DC magnetron sputtering

Photocatalytic Property of Amorphous Wo3 Films Prepared by Reactive Magnetron Sputtering

Study on the Structure and Electrochromism of WO<sub>3</sub> and Ti-Doped WO<sub>3</sub> Films

Electrochromic Properties and Performance of NiOx Films and Their Corresponding All-Thin-film Flexible Devices Preparedby Reactive DC Magnetron Sputtering

Electrochromic performance of WO3 films: optimization by crystal network topology modification