The Research of Photo-carable and Imprint Lithography for Integrate Circuit Chip

段玉岗,丁玉成,卢秉恒,王立永
DOI: https://doi.org/10.3969/j.issn.1001-3881.2004.12.003
2004-01-01
Abstract:The manufacturing process of IC by imprint lith og raphy was researched,the photo-curable material for Imprint Lithography was prep ared.and imprint lithography process,micro-copy effect,disfigurement controlling were researched.The suitable process was presented according to the characteris tic of photo-curable material for imprint lithography.
What problem does this paper attempt to address?