Drought Resistance of Wheat NILs with Different Cuticular Wax Contents in Flag Leaf

XU Wen,SHEN Hao,GUO Jun,YU Xiao-Cong,LI Xiang,YANG Yan-Hui,MA Xiao,ZHAO Shi-Jie,SONG Jian-Min
DOI: https://doi.org/10.3724/sp.j.1006.2016.01700
2016-01-01
ACTA AGRONOMICA SINICA
Abstract:The relationship of flag leaf cuticular wax content with leaf water potential, excised-leaf water loss, leaf photosynthesis characteristics and wheat yield under drought stress were analyzed in 2013–2014 and 2014–2015 wheat seasons using four wheat nearly isogenetic lines (NILs) differing in cuticular wax content in flag leaf. Under drought stress condition, the average flag leaf cuticular wax content of the high-wax NILs (15.15 mg g-1) was 79.8% higher than that of the low-wax NILs (8.43 mg g-1). Com-pared with the low-wax NILs, the high-wax NILs showed significantly higher water potential in flag leaf and lower water loss rate (P< 0.05). In response to drought stress, photosynthetic rate (Pn) andFv/Fm of flag leaf declined in both types of NILs, however, the decrease percentages were lower in the high-wax NILs (7.5% and 3.4%, respectively) than in the low-wax NILs (9.8% and 5.8%, respectively). As a result, the average yield of the high-wax NILs was 3.7% higher than that of the low-wax NILs, and the drought tolerance (TOL) and stress susceptible index (SSI) of the high-wax NILs were significantly less than those of the low-wax NILs (P< 0.05). These results indicate that cuticular wax content in flag leaf is closely related to drought tolerance and can be used as a physiological indicator of drought resistance in wheat selection.
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