Preparation and Adsorption Properties of New Chelating Resin Based on Chloromethylated Polystyrene Beads Via Surface-Initiated Atom Transfer Radical Polymerization

Wang Qin-Hui,Wang Chao-Zhan,Wei Yin-Mao
DOI: https://doi.org/10.7503/cjcu20120078
2012-01-01
Abstract:A new chelating resin was prepared by grafting poly (glycidyl methacrylate) (PGMA) onto the chloromethylated polystyrene beads via surface-initiated atom transfer radical polymerization (SI-ATRP), and followed by the reaction of epoxy groups in the grafted PGMA with iminodiacetic acid (IDA). The structure of chelating resin was characterized using Fourier transform infrared spectroscopy, elemental analysis, surface area and porosity analyzer. An increase in the polymerization time leads to the increases in GMA grafting yield, IDA binding amount and adsorption capacities of Ni(II), Cu(II) and Pb(II). When the polymerization time was 18 h, the maximum sorption capacities of Ni(II), Cu(II) and Pb(II) were 1.29, 1.19 and 0.83 mmol/g, respectively, which were higher than those on the same type of the reported absorbent. The results indicated ATRP is a feasible method to prepare chelating resin with higher and controlled adsorption capacity.
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