Abstract:Pixelated micro-polarizer array is an attractive polarization imaging device because of its real-time fully detecting capability to Stokes parameters and high integration level. However, this micro-device is commonly fabricated by electron beam lithography, thus is often high- cost. Since periodic unit of this device is a 2x2 array of four types of one-dimensional (1D) gratings with different orientations (0 degrees, 45 degrees, 90 degrees, 135 degrees), a low-cost grating fabrication technique, interference lithography (IL), is possible to be used to fabricate this device. In this research, a four-steps exposure patterning method of micro-polarizer array based on single Lloyd's mirror interferometer IL is developed. This interferometer is composed by two perpendicular parts: a mirror and a photoresist holder, and a 1D grating parallel with mirror can be fabricated in the exposure region on photoresist through lithography. A Cr-based mask, whose transparent pattern is a square array of square windows with 15x15 mu m(2) window size and 17 mu m window spacing, is introduced and clamped onto the photoresist to cut exposure region. In four exposure steps, each 15x15 mu m(2) quadrant area of a polarizer array with 2 mu m quadrant spacing will be exposed on photoresist, respectively. Between two exposure steps, mask and photoresist substrate need to be simultaneously horizontal rotated, to adjust the orientation of grating fabricated in next exposed quadrant on photoresist. Based on this method, we fabricated the single-state patterned micro-polarizer array, which effectively controls the cost and fabrication cycle. The experimental results show that the photoresist grating within a single window has stable structure, uniform period and good directivity.

Investigation of achromatic micro polarizer array for polarization imaging in visible-infrared band

Polarization imaging by micro-polarizer array

Design and performance analysis of infrared micro-polarizer array

Polarization-interferometry-based Wavelength-Interrogation Surface Plasmon Resonance Imager for Analysis of Microarrays

Nano-Fabricated Pixelated Micropolarizer Array for Visible Imaging Polarimetry

A Micro-Polarizer Array Configuration Design Method for Division of Focal Plane Imaging Polarimeter

Integrated Structure of Polarization Detection in the Visible Spectrum Based on Double Wire Grids

Electron Beam Lithographic Pixelated Micropolarizer Array for Real-Time Phase Measurement

A compact polarization-integrated long wavelength infrared focal plane array based on InAs/GaSb superlattice

Optimizing the Design of an Embedded Grating Polarizer for Infrared Polarization Light Field Imaging

Integrating Subwavelength Polarizers Onto InP-InxGa1−As Sensors for Polarimetric Detection at Short Infrared Wavelength

Patterned Dual-Layer Achromatic Micro-Quarter-wave-retarder Array for Active Polarization Imaging.

Reverse Design of Pixel-Type Micro-Polarizer Arrays to Improve Polarization Image Contrast

Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

Real-time Dynamic Phase Measurement Based on Pixelated Micropolarizer Array

A four-step laser interference lithography for patterning pixelated micro-polarizer array

Pixelated Micropolarizer Array Based on Carbon Nanotube Films

Polarization Insensitive Arrayed-Input Spectrometer Chip Based on Silicon-on-insulator Echelle Grating

Broadband and Wide Angle Infrared Wire-Grid Polarizer.

Midinfrared real-time polarization imaging with all-dielectric metasurfaces