Ultrafast UV Luminescence of ZnO Films: Sub‐30 ps Decay Time with Suppressed Visible Component
Marilou Cadatal‐Raduban,Jiří Olejníček,Kota Hibino,Yuki Maruyama,Aneta Písaříková,Keito Shinohara,Toru Asaka,Lenka Lebedová Volfová,Michal Kohout,Zhang Jiaqi,Yugo Akabe,Makoto Nakajima,John A. Harrison,Rainer Hippler,Nobuhiko Sarukura,Shingo Ono,Zdeněk Hubička,Kohei Yamanoi
DOI: https://doi.org/10.1002/adom.202400377
IF: 9
2024-05-11
Advanced Optical Materials
Abstract:Undoped micrometer (μm)‐thick zinc oxide (ZnO) films with intense ultraviolet (UV) luminescence, ultrafast picosecond decay times, and suppressed defect‐related visible luminescence owing to better crystallinity, fewer defects, and decreased oxygen vacancies are deposited on bufferless soda lime glass substrates using a hybrid plasma deposition technique combining pulsed reactive magnetron sputtering operating in the medium‐frequency range (MF magnetron) with an electron cyclotron wave resonance (ECWR) plasma. Ultrafast sub‐100 picosecond luminescence is vital in many applications involving ultrafast events and time‐of‐flight systems. Materials exhibiting fast luminescence, such as barium fluoride (BaF2) and zinc oxide (ZnO), also suffer from an intrinsically slow nanosecond (ns) to microsecond (μs) luminescence. Here, 2.2 micrometer (μm)‐ to 5.7 μm‐thick undoped ZnO films on soda‐lime glass (SLG) substrates without a buffer layer by a hybrid pulsed reactive magnetron sputtering operating in the medium‐frequency range (MF magnetron) assisted by an electron cyclotron wave resonance (ECWR) plasma is deposited. The undoped ZnO films exhibited superior optical properties characterized by intense ultraviolet (UV) luminescence, unprecedented ultrafast decay times, and for the case of MF+ECWR‐deposited films, suppressed defect‐related visible luminescence. The 2.2 μm‐thick MF‐deposited film exhibited the fastest 9‐ps decay time at room temperature. The impressive properties of the films are attributed to the use of advanced deposition technology with properly tuned plasma parameters, especially a high degree of dissociation of molecular oxygen together with an increased proportion of activated zinc particles, leading to a higher deposition rate, better crystallinity, fewer defects, and a lower proportion of oxygen vacancies. These films will pave the way toward the development of time‐of‐flight detectors, high‐resolution nuclear imaging cameras, and high‐rate ultrafast timing devices.
materials science, multidisciplinary,optics