Oxygen Pressure Dependences of Structure and Properties of ZnO Films Deposited on Amorphous Glass Substrates by Pulsed Laser Deposition
Bai Lin Zhu,Xing Zhong Zhao,Sheng Xu,Fu Hai Su,Guo Hua Li,Xiao Guang Wu,Jun Wu,Run Wu,Jing Liu
DOI: https://doi.org/10.1143/jjap.47.2225
IF: 1.5
2008-01-01
Japanese Journal of Applied Physics
Abstract:ZnO films are prepared on glass substrates by pulsed laser deposition (PLD) at different oxygen pressures, and the effects of oxygen pressure on the structure and optoelectrical properties of as-grown ZnO films are investigated. The results show that the crystallite size and surface roughness of the films increase, but the carrier concentration and optical energy gap E(g) decrease with increasing oxygen pressure. Only UV emission is found in the photoluminescence (PL) spectra of all the samples, and its intensity increases with oxygen pressure. Furthermore, there are marked differences in structure and properties between the films grown at low oxygen pressures (0.003 and 0.2 Pa) and the films grown at high oxygen pressures (24 and 150 Pa), which is confirmed by the fact that the crystallite size and UV emission intensity markedly increase, but the carrier concentration markedly decreases as oxygen pressure increases from 0.2 to 24 Pa. These results show that the crystal quality, including the microstructural quality and stoichiometry proportion, of the prepared ZnO films improves as oxygen pressure increases, particularly from 0.2 to 24 Pa.