Metallic Nanonetworks: A Practical ITO Replacement Strategy: Sputtering‐Free Processing of a Metallic Nanonetwork (adv. Mater. Technol. 8/2017)

Zhike Xian,Bing Han,Songru Li,Chaobin Yang,Sujuan Wu,Xubing Lu,Xingsen Gao,Min Zeng,Qianming Wang,Pengfei Bai,Michael J. Naughton,Guofu Zhou,Jun‐Ming Liu,Krzysztof Kempa,Jinwei Gao
DOI: https://doi.org/10.1002/admt.201770036
IF: 6.8
2017-01-01
Advanced Materials Technologies
Abstract:In article number 1700061, Pengfei Bai, Krzysztof Kempa, Jinwei Gao, and co-workers present a high performance flexible metallic crack-nanonetwork (with the best figure of merit ≈20 000 at T ≈ 86.4% and Rs ≈ 0.13 Ω sq−1) by employing a sputtering/evaporation-free, solution based process. This network outperforms the current industry standard, indium tin oxide (ITO), in performance and cost. In particular, the processing is fully compatible with R2R processing. It is therefore a viable, practical ITO replacement.
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