Improving Electrical Properties of Multiple Dopant ZnO Varistor by Doping with Indium and Gallium

Pengfei Meng,Shanqiang Gu,Jian Wang,Jun Hu,Jinliang He
DOI: https://doi.org/10.1016/j.ceramint.2017.07.173
IF: 5.532
2018-01-01
Ceramics International
Abstract:We studied the effects of indium doping on the microstructure and electrical properties of ZnO varistors co-doped with Al2O3 and Ga2O3. Scanning electron microscopy, current–voltage testing, capacitance–voltage testing, and X-ray diffraction were performed. The results showed that the leakage current of sintered varistors decreased as the indium dopant concentration was increased. The average grain size decreased slightly with increasing indium content, which improved the voltage gradient. A certain amount of the doped In3+ dissolved into the grains causing the grain resistance to decrease, which resulted in a low level residual voltage. The sintered samples with 0.024mol% indium, 0.2mol% aluminum, and 0.42mol% gallium showed excellent overall performance, exhibiting a nonlinear coefficient of 58.8, a leakage current of 1.82µA/cm2, a 1-mA residual voltage of 433.9V/mm, and a residual voltage ratio of 1.53. The obtained co-doped ZnO varistors will provide better protection and stability in applications as metal oxide arresters for power systems.
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