Dry‐etching‐assisted Femtosecond Laser Machining (laser Photonics Rev. 11(3)/2017)

Xue‐Qing Liu,Qi‐Dai Chen,Kai‐Min Guan,Zhuo‐Chen Ma,Yan‐Hao Yu,Qian‐Kun Li,Zhen‐Nan Tian,Hong‐Bo Sun
DOI: https://doi.org/10.1002/lpor.201770032
2017-01-01
LASER & PHOTONICS REVIEWS
Abstract:Although femtosecond laser machining has been widely used for fabricating arbitrary micro/nano structures, it suffers from the problems of low fabrication efficiency and high surface roughness when processing hardmaterials. A dry-etching-assisted femtosecond laser machining (DE-FsLM) approach is proposed to solve these problems. As the dry etching system is compatible with the IC fabrication process, the DE-FsLM technology shows great potential for application in the device integration processing industry. (Picture: Prof. Hong-Bo Sun et al., article number 1600115, in this issue)
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