Analysis and Controller Design of Fringe Phase Locking System for Interference Lithography

Lu Sen,Yang Kai-ming,Zhu Yu,Zhang Ming,Wang Lei-jie,Hu Chu-xiong
DOI: https://doi.org/10.3788/gzxb20174601.0123001
IF: 0.6
2017-01-01
ACTA PHOTONICA SINICA
Abstract:The intensity of a fixed point in the interference fringes is closely related to the phase change of interference fringes. According to this principle, a real-time phase locking system was established by the analysis of the intensity field. The intensity voltage of a fixed point in the interference fringes was detected as a feedback signal by a photodetector, and an acoustic optical modulator was used to shift the frenquency of the Gaussian beam in real time. By setting intensity voltage to a fixed value, phase locking function was realized. Theoretical model of fringe phase locking system was derivated and verified by experiment. A phase locking controller was also designed based on the model. The experiment results illustrate that, the phase drift is within 0. 04 period under the 400 Hz control frequency, which satisfies the exposure requirements of interference lithography.
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