Universal Scaling of the Anomalous Hall Effect

Xiaoqian Zhang,Wei Wang,Kejie Wang,Wei Niu,Bolin Lai,Nick Maltby,Mao Yang,Ming Gao,Wenqing Liu,Liang He,Rong Zhang,Yongbing Xu
DOI: https://doi.org/10.1088/1361-6463/aa5b1c
2017-01-01
Abstract:We have undertaken a detailed study of the magneto-transport properties of ultra-thin Fe films epitaxially grown on GaAs (1 0 0). A metal-semiconductor transition has been observed with a critical thickness of 1.25 nm, which was thought to be related to the thermally activated tunneling between metallic clusters. By fitting rho(AH) versus rho(xx) (2) with the TYJ equation (Tian et al 2009 Phys. Rev. Lett. 103 087206), we found that the magnetization is negligible for the scaling of the anomalous Hall effect in ultra-thin Fe films. Furthermore, the intrinsic term, which is acquired by the linear fitting of rho(AH) versus rho(2)(xx), shows an obvious decrease when the film thickness drops below 1.25 nm, which was thought to be related to the fading of the Berry curvature in the ultra-thin film limit.
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