Tunable Deep Ultraviolet Laser Based Near Ambient Pressure Photoemission Electron Microscope for Surface Imaging in the Millibar Regime.
Yanxiao Ning,Yifan Li,Chao Wang,Rongtan Li,Fengfeng Zhang,Shenjin Zhang,Zhimin Wang,Feng Yang,Nan Zong,Qinjun Peng,Zuyan Xu,Xiaoyang Wang,Rukang Li,Martin Breitschaft,Sebastian Hagen,Oliver Schaff,Qiang Fu,Xinhe Bao
DOI: https://doi.org/10.1063/5.0016242
IF: 1.6
2020-01-01
Review of Scientific Instruments
Abstract:A newly developed instrument comprising a near ambient pressure (NAP) photoemission electron microscope (PEEM) and a tunable deep ultraviolet (DUV) laser source is described. This NAP-PEEM instrument enables dynamic imaging of solid surfaces in gases at pressures up to 1 mbar. A diode laser (976 nm) can illuminate a sample from the backside for in situ heating in gases up to 1200 K in minutes. The DUV laser with a tunable wavelength between 175 nm and 210 nm is perpendicularly incident onto the sample surface for PEEM imaging of a wide spectrum of solids with different surface work functions. Using this setup, we have first demonstrated spatiotemporal oscillation patterns of CO oxidation reaction on Pt(110) from high vacuum to NAPs and gas-induced restructuring of metal nanostructures in millibar gases. The new facility promises important applications in heterogeneous catalysis, electrochemical devices, and other surface processes under nearly working conditions.