Ultrathin Free-Standing Oxide Membranes for Electron and Photon Spectroscopy Studies of Solid–Gas and Solid–Liquid Interfaces
Yi-Hsien Lu,Carlos Morales,Xiao Zhao,Matthijs A. van Spronsen,Artem Baskin,David Prendergast,Peidong Yang,Hans A. Bechtel,Edward S. Barnard,D. Frank Ogletree,Virginia Altoe,Leonardo Soriano,Adam M. Schwartzberg,Miquel Salmeron
DOI: https://doi.org/10.1021/acs.nanolett.0c01801
IF: 10.8
2020-08-05
Nano Letters
Abstract:Free-standing ultrathin (∼2 nm) films of several oxides (Al<sub>2</sub>O<sub>3</sub>,TiO<sub>2</sub>, and others) have been developed, which are mechanically robust and transparent to electrons with <i>E</i><sub>kin</sub> ≥ 200 eV and to photons. We demonstrate their applicability in environmental X-ray photoelectron and infrared spectroscopy for molecular level studies of solid–gas (≥1 bar) and solid–liquid interfaces. These films act as membranes closing a reaction cell and as substrates and electrodes for electrochemical reactions. The remarkable properties of such ultrathin oxides membranes enable atomic/molecular level studies of interfacial phenomena, such as corrosion, catalysis, electrochemical reactions, energy storage, geochemistry, and biology, in a broad range of environmental conditions.The Supporting Information is available free of charge at <a class="ext-link" href="/doi/10.1021/acs.nanolett.0c01801?goto=supporting-info">https://pubs.acs.org/doi/10.1021/acs.nanolett.0c01801</a>.PE-ALD growth of metal-oxides, graphene and polymer transfer on perforated SiN membranes, thickness estimation of free-standing metal-oxides by EELS, TEM/EELS characterization of free-standing Al<sub>2</sub>O<sub>3</sub> windows, and XPS depth profile analysis of Al<sub>2</sub>O<sub>3</sub> thin film (<a class="ext-link" href="/doi/suppl/10.1021/acs.nanolett.0c01801/suppl_file/nl0c01801_si_001.pdf">PDF</a>)This article has not yet been cited by other publications.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology