High-surface-area ceria prepared by ALD on Al 2 O 3 support

Tzia Ming Onn,Shuyi Zhang,Lisandra Arroyo-Ramírez,Ye Xia,Cong Wang,Xiaoqing Pan,George W. Graham,Raymond J. Gorte
DOI: https://doi.org/10.1016/j.apcatb.2016.08.054
2017-01-01
Abstract:•Active high-surface-area ceria support was prepared by Atomic Layer Deposition (ALD) of CeO2 on porous Al2O3.•TEM shows CeO2 added by ALD forms a conformal film over the Al2O3.•Pd-impregnated on the ALD-modified support exhibits higher WGS and CO-oxidation rates due to the improved Pd-ceria contact.•The ALD-prepared catalyst shows improved thermal stability compared to bulk CeO2.
What problem does this paper attempt to address?