Comparison Study of $\beta $ -Ga2o3photodetectors on Bulk Substrate and Sapphire

Qian Feng,Lu Huang,Genquan Han,Fuguo Li,Xiang Li,Liwei Fang,Xiangyu Xing,Jincheng Zhang,Wenxiang Mu,Zhitai Jia,Daoyou Guo,Weihua Tang,Xutang Tao,Yue Hao
DOI: https://doi.org/10.1109/ted.2016.2592984
2016-01-01
Abstract:We fabricated beta-Ga2O3 photodetectors on bulk substrate and sapphire. Bulk Ga2O3 photodetector demonstrates the improved responsivity compared with the device on sapphire, due to the higher crystal quality in bulk material. Optical gain is achieved in both the devices. For the first time, we report that the Ga2O3 photodetector epitaxially grown on sapphire achieves a blueshift of bandgap in comparison with bulk device. Based on the measured responsivity characteristics, the direct and indirect E-G of bulk Ga2O3 are 4.78 and 4.59 eV, respectively. The Ga2O3 photodetector on sapphire exhibits a maximum cutoff wavelength at 253 nm, corresponding to the direct E-G of 4.90 eV. The increment of E-G in Ga2O3 on sapphire over bulk material is attributed to the residual strain in the film. The time-dependent photoresponse of the devices suggests that Ga2O3 on sapphire might have more oxygen vacancies than the bulk material.
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