Performance Enhancement on A Micro-Column Structure Reformer Via Thick-Film Photoresist Pre-Protection

Kuo-Yang Huang,Shu-Ping Lai,Hsueh-Sheng Wang,Fan-Gang Tseng,Yuh-Jeen Huang
DOI: https://doi.org/10.1088/0960-1317/25/11/115021
2015-01-01
Journal of Micromechanics and Microengineering
Abstract:In this study, a reformer stack was made by incorporating silicon technology into catalyst preparation. The volumes of an individual micro-channel chip and a whole reformer stack were 0.4 cm(3) and 16 cm(3), respectively. Different weight ratios (B/C = 35, 15, 5, and 0 wt%) of binder (a mixture of boehmite, bentonite, and deionized water) and catalyst were mixed to find out the optimal adhesion between the catalyst and silicon substrate. The results from this study show that the percentage of weight loss of the catalyst on the silicon substrate increases as the concentration of inorganic binder decreases. To further increase the exposed surface area of the catalyst deposited on the micro-channels, micro-column structures were integrated into the channels; however, a blockage of the catalysts among the columns during deposition was encountered. To resolve this issue, a method of pre-protecting the micro-channel with thick-film photoresist was utilized for the catalyst deposition, and the performance of the fabricated micro-column reformer was able to reach a 95% methanol conversion rate, 90% hydrogen selectivity, and 1.6 x 10(-5) (mol min(-1)) hydrogen yield at 225 degrees C in the partial oxidation of methanol reaction.
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