Mechanism for Orientation Dependence of Blisters on W Surface Exposed to D Plasma at Low Temperature

Y. Z. Jia,W. Liu,B. Xu,G. -N. Luo,S. L. Qu,T. W. Morgan,G. De Temmerman
DOI: https://doi.org/10.1016/j.jnucmat.2016.05.011
IF: 3.555
2016-01-01
Journal of Nuclear Materials
Abstract:The orientation dependence of blister formation induced by D plasma exposure at low temperature (about 523 K) on rolled tungsten and chemical vapor deposition (CVD) W samples was studied by scanning electron microscopy and electron backscatter diffraction. Severe blistering was observed on grains with surface normal directions close to [111], while the [001] surfaces are the most resistant to blister formation. Cavities induced by D-2 gas were observed beneath [111], [110] and [001] surfaces, independently on whether blisters were observed on the surface or not. The [111] surface is more prone to blister formation, because it is easily plastically deformed by the D-2 gas pressure. Some blister edges and steps were perpendicular to [110] directions, which may be induced by the slipping of dislocations on {110} planes. The blister morphology induced by D plasma can be well explained by the blister model based on plastic deformation mechanism. (C) 2016 Elsevier B.V. All rights reserved.
What problem does this paper attempt to address?