INVESTIGATION FOR THE OXIDATION BEHAVIOR OF NIOBIUM SILICIDES BY X-RAY DIFFRACTION

周健威,姜传海,叶长青,吴建生
DOI: https://doi.org/10.3969/j.issn.1001-4012.2004.01.004
2004-01-01
Abstract:The oxidation behavior of Nb_5Si_3-66%NbSi_2 (volume fraction) and NbSi_2 at medial temperature was Investigated by X-ray diffraction, and the structure of the oxide layer was also analyzed. The results showed that with the increase of silicon content, the oxidation resistance of the material will be improved. The oxidation rate of NbSi_2 is slower than that of other niobium silicides. In addition, when NbSi_2 is oxidized under a low oxygen pressure, the oxidation products will contain Nb_2O_5 and NbO oxide.
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