The Study on Foundation of Electrodeposited Silicon in Fused Salts

李运刚,蔡宗英,唐国章,梁精龙
DOI: https://doi.org/10.3969/j.issn.1007-7545.2004.03.008
2004-01-01
Abstract:The electrochemical reaction mechanism and diffusion coefficient of Si~(4+) are studied in FLINAK- Na2SiF6 system by Cyclic Voltammetry and Chronopotentionmetry at 750℃. Pt, silicon sheet and graphite are respectively reference electrode, working electrode and auxiliary electrode. The results indicate that electrodeposited silicon is viable in this fused salt system. The electrochemical reaction of Si~(4+) is reversible electrode process by diffusion controlling and the production cannot be dissolved; The whole electrochemical reaction process is Si~(4+) + 4e →Si~0, The electric potential of cathode shouldn't be less than -2V, or Na will be deposited out and affect the quality of deposit. Diffusion coefficient of Si~(4+) is 5.42×10~(-11)m~2/s.
What problem does this paper attempt to address?