EFFECT OF EXPOSURE ON THE DIELECTRIC BARRIER DISCHARGE PHOTOGRAPHY

Ming Weng,Qisheng CHEN,Rici WU
DOI: https://doi.org/10.3969/j.issn.1001-1609.2001.01.004
2001-01-01
Abstract:In this paper, the basic principle of dielectric barrier discharge photography(DBDP) is discussed. An imaging equipment is set up for the purpose of studying the effect of exposure on the DBDP, by which this influences of exposure time and resistance in discharge circuit on the quality of DBDP are studied, respectively. Based on this results, the author advances that in the premise of using high-voltage nanosecond pulse discharge technology, controlling the exposure time and the resistance synthetically is a key for getting a good image of DBDP.
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