Study on Survival Rate of Watermelon Shoots Implanted with Low Energy Ion Beams

尹若春,吴丽芳,郭金华,黄群策,吴李君,余增亮
DOI: https://doi.org/10.3969/j.issn.1007-7146.2002.03.011
2002-01-01
Abstract:While implanted with low energy ion beam (LEIB),plant living tissue-shoots of watermelon were well protected by pretreatment with dimethysulfoxide(DMSO).The results showed that,although affected by vacuum,low survival rate of living shoots after ion implantation was mainly caused by damage from implantation.After implantation at energy of 25 keV,total dosage of 3.9×10 16 ions/cm 2,pulse dosage of 1.3×10 14 ions/cm 2,25~35 minutes pretreatment with 1% DMSO may decrease the loss rate of water and increase the survival rate.The results may be applied to enlarge the application scope of LEIB implantation,and make it possible to breed flowers,fruit tree and asexual crops or transfer foreign gene into these plants with this new method.
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