Study on Electrical Defects Level in Single Layer Two-Dimensional Ta2o5

Dahai Li,Xiongfei Song,Linfeng Hu,Ziyi Wang,Rongjun Zhang,Liangyao Chen,David Wei Zhang,Peng Zhou
DOI: https://doi.org/10.1088/1674-1056/25/4/047304
2016-01-01
Chinese Physics B
Abstract:Two-dimensional atomic-layered material is a recent research focus, and single layer Ta2O5 used as gate dielectric in field-effect transistors is obtained via assemblies of Ta2O5 nanosheets. However, the electrical performance is seriously affected by electronic defects existing in Ta2O5. Therefore, spectroscopic ellipsometry is used to calculate the transition energies and corresponding probabilities for two different charged oxygen vacancies, whose existence is revealed by x-ray photoelectron spectroscopy analysis. Spectroscopic ellipsometry fitting also calculates the thickness of single layer Ta2O5, exhibiting good agreement with atomic force microscopy measurement. Nondestructive and noncontact spectroscopic ellipsometry is appropriate for detecting the electrical defects level of single layer Ta2O5.
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