Study on Electrical Defects Level in Single Layer Two-Dimensional Ta 2 O 5

Ziyi Wang
DOI: https://doi.org/10.1088/1674-1056/25/4/047304
2016-01-01
Abstract:Two-dimensional atomic-layered material is a recent research focus, and single layer Ta 2 O 5 used as gate dielectric in field-effect transistors is obtained via assemblies of Ta 2 O 5 nanosheets. However, the electrical performance is seriously affected by electronic defects existing in Ta 2 O 5 . Therefore, spectroscopic ellipsometry is used to calculate the transition energies and corresponding probabilities for two different charged oxygen vacancies, whose existence is revealed by x-ray photoelectron spectroscopy analysis. Spectroscopic ellipsometry fitting also calculates the thickness of single layer Ta 2 O 5 ,exhibiting good agreement with atomic force microscopy measurement. Nondestructive and noncontact spectroscopic ellipsometry is appropriate for detecting the electrical defects level of single layer Ta 2 O 5 .
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