Intrinsic Defects and Electronic Conductivity of Taon: First-Principles Insights

Shiyou Chen,Wang
DOI: https://doi.org/10.1063/1.3664346
IF: 4
2011-01-01
Applied Physics Letters
Abstract:As a compound in between the tantalum oxide and nitride, the tantalum oxynitride TaON is expected to combine their advantages and act as an efficient visible-light-driven photocatalyst. In this letter, using hybrid functional calculations we show that TaON has different defect properties from the binary tantalum oxide and nitride: (i) instead of O or N vacancies or Ta interstitials, the O_N antisite is the dominant defect, which determines its intrinsic n-type conductivity and the p-type doping difficulty; (ii) the O_N antisite has a shallower donor level than O or N vacancies, with a delocalized distribution composed mainly of the Ta 5d orbitals, which gives rise to better electronic conductivity in the oxynitride than in the oxide and nitride. The phase stability analysis reveals that the easy oxidation of TaON is inevitable under O rich conditions, and a relatively O poor condition is required to synthesize stoichiometric TaON samples.
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