Dielectric passivation layer as a substratum on localized single-cell electroporation

Tuhin Subhra Santra,Chih-Wei Chen,Hwan-You Chang,Fan-Gang Tseng
DOI: https://doi.org/10.1039/C5RA18258A
IF: 4.036
2016-01-01
RSC Advances
Abstract:Single-cell electroporation is a powerful technique to understand cellular behavior with heterogeneity, which might be impossible based on bulk measurements of millions of cells together. In this study, a dielectric passivation layer was deposited on top of an indium-tin oxide micro-electrode-based transparent chip surface using a plasma enhanced chemical vapour deposition technique. We theoretically and experimentally investigated the key effects of the dielectric passivation layer on localized single-cell electroporation for different cancer cells, which were randomly distributed with a high density throughout the chip surface as a monolayer. The passivation layer not only prevented the conventional or bulk electroporation with bubble and ion generation, but also provide an intense electric field in-between electrode gap for localized single-cell electroporation with high cell viability. Thus, devices with dielectric passivation layers are potentially applicable for single-cell studies.
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