A Sequential Process of Graphene Exfoliation and Site-Selective Copper/Graphene Metallization Enabled by Multifunctional 1-Pyrenebutyric Acid Tetrabutylammonium Salt.

Jie Zhao,Chenyu Wen,Rui Sun,Shi-Li Zhang,Biao Wu,Zhi-Bin Zhang
DOI: https://doi.org/10.1021/acsami.8b21162
IF: 9.5
2019-01-01
ACS Applied Materials & Interfaces
Abstract:This paper reports a procedure leading to shear exfoliation of pristine few-layer graphene flakes in water and subsequent site-selective formation of Cu/graphene films on polymer substrates, both of which are enabled by employing the water soluble 1-pyrenebutyric acid tetrabutylammonium salt (PyB-TBA). The exfoliation with PyB-TBA as an enhancer leads to as-deposited graphene films dried at 90 degrees C that are characterized by electrical conductivity of similar to 110 S/m. Owing to the good affinity of the tetrabutylammonium cations to the catalyst PdCl42-, electroless copper deposition selectively in the graphene films is initiated, resulting in a self-aligned formation of highly conductive Cu/graphene films at room temperature. The excellent solution-phase and low-temperature processability, self-aligned copper growth, and high electrical conductivity of the Cu/graphene films have permitted fabrication of several electronic circuits on plastic foils, thereby indicating their great potential in compliant, flexible, and printed electronics.
What problem does this paper attempt to address?