Intralayered Ostwald Ripening to Ultrathin Nanomesh Catalyst with Robust Oxygen‐Evolving Performance

Junfeng Xie,Xiaodong Zhang,Hao Zhang,Jiajia Zhang,Shuang Li,Ruoxing Wang,Bicai Pan,Yi Xie
DOI: https://doi.org/10.1002/adma.201604765
IF: 29.4
2017-01-01
Advanced Materials
Abstract:An etching-intralayered Ostwald ripening process is proposed, which leads to the formation of a β-Ni(OH)2 ultrathin nanomesh with abundant and uniformly distributed nanopores of 3-4 nm. The nanomesh catalyst exhibits outstanding oxygen evolution reaction performance, with high catalytic current density and superior long-term stability, making this Earth-abundant nanomesh catalyst a promising candidate for commercial water splitting.
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