Large-Area Highly Conductive Transparent Two-Dimensional Ti2ctx Film

Yajie Yang,Sima Umrao,Shen Lai,Sungjoo Lee
DOI: https://doi.org/10.1021/acs.jpclett.6b03064
2017-01-01
Abstract:We report a simple and scalable method to fabricate homogeneous transparent conductive thin films (Ti2CTx, one of the MXene) by dip coating of an Al2O3 substrate in a colloidal solution of large area Ti2CTx thin flakes. Scanning electron microscopy and atomic force microscopy images exhibit the wafer-scale homogeneous Ti2CTx thin film (similar to 5 nm) covering the whole substrate. The sheet resistance is as low as 70 Omega/sq at 86% transmittance, which corresponds to the high figure of merit (FOM) of 40.7. Furthermore, the thickness of the film is tuned by a SF6+Ar plasma treatment, which etches Ti2CTx film layer by layer and removes the top oxidized layer without affecting the bottom layer of the Ti2CTx, flake. The resistivity of plasma-treated Ti2CTx, film is further decreased to 63 Omega/sq with an improved transmittance of 89% and FOM of 51.3, demonstrating the promise of Ti2CTx for future transparent conductive electrode application.
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