Effect of Substrate symmetry on the dendrite morphology of MoS 2 Film synthesized by CVD.

Di Wu,Tai Min,Jian Zhou,Chen Li,Guobin Ma,Gaotian Lu,Minggang Xia,Zhengbin Gu

DOI: https://doi.org/10.1038/s41598-017-13238-x

IF: 4.6

2017-01-01

Scientific Reports

Abstract:In van der Waals epitaxial growth, the substrate plays a particularly important role in the crystal morphology. Here, we synthesized MoS by chemical vapour deposition on silicon carbide (SiC). The obtained MoS dendritic crystals show six-fold symmetry, which are different from the conventional triangular shapes on SiO substrate and from those with three-fold symmetry on SrTiO substrate. Interestingly, these MoS dendritic crystals on SiC exhibit an average fractal dimension 1.76, which is slightly larger than the classical Diffusion-limited-Aggregation fractal dimension 1.66. The first principle calculation indicates that the six-fold symmetry of the dendritic MoS is determined by the lattice symmetry of SiC. To further demonstrating the substrate effect, we break the natural six-fold lattice symmetry of SiC (0001) into groove arrays through etching the substrate. And then we successfully synthesized cross-type dendritic crystal MoS with two-fold symmetry. Its average fractal dimension 1.83 is slightly larger than the fractal dimension 1.76 of the previous MoS dendrite with six-fold symmetry. In a word, the symmetry of SiC substrate determined the symmetry and the fractal dimension of the dendritic MoS. This work provides one possibility of inducing the growth orientation of dendritic crystals through controlling the substrate surface symmetry artificially.