Mechanical Properties of Nano Ti Films with Different Thickness

wang haidou,dong meiling,cui xiufang,xing zhiguo,zhu lina,liu jinna

DOI: https://doi.org/10.11868/j.issn.1001-4381.2015.11.009

2015-01-01

Abstract:Four nano-Ti films with different thickness were deposited by direct current magnetron sputtering(DCMS).The mechanical properties and residual stress of the deposited Ti films were studied using nano indentation and electronic film stress distribution tester,surface roughness and surface morphology were analyzed using fractal dimension and the atomic force microscopy(AFM)respectively.The results show that,with the increase of the film thickness,the Ti crystal grain size increases gradually and both the surface roughness and residual stress increase first and then decrease,while the hardness and elastic modulus exhibit the opposite tendency. When the thickness of the deposited films is 600,2400 nm and 3600 nm,the residual compressive stress exists;when the film thickness is 1200 nm,the residual tensile stress exists,the distribution of residual stress is most uniform,when the residual tensile stress exists in the thin films,but the hardness and elastic modulus are lower.The analysis shows that residual tensile stress results in the decrease of the hardness and elastic modulus in Ti thin films,the residual compressive stress exhibits an opposite trend.