A cationic surfactant-induced selective etching strategy for the synthesis of organosilica hollow nanospheres

Yu Wang,Lianxi Chen,Zhenhui Liu,Jie Li,Pengpeng Wang
DOI: https://doi.org/10.1007/s10971-018-4705-z
2018-01-01
Journal of Sol-Gel Science and Technology
Abstract:The simple and effective synthesis of well-defined organosilica hollow nanospheres (OHNSs) for fundamental research and practical applications is still a significant challenge. In this work, a facile “cationic surfactant-induced selective etching” strategy was developed for the fabrication of hollow thiocyanatopropyl silsesquioxanes (thiocyanatopropyl-SQ), mercaptopropyl silsesquioxane (mercaptopropyl-SQ) from cyanoethyl-SQ@thiocyanatopropyl-SQ and cyanoethyl-SQ@mercaptopropyl-SQ, respectively. The experiments demonstrated that cetyltrimethylammonium bromide (CTAB) had remarkable influence on the formation of hollow structure and could accelerate the etching process significantly. A formation mechanism initiated by the adsorption of cationic surfactant followed by the etching of inner core with NH 3 ·H 2 O was proposed. Hollow thiocyanatopropyl-SQ and mercaptopropyl-SQ with various shell thickness could be prepared by manipulating the amount of CTAB. And large-scale OHNSs were obtained at appropriate concentration of CTAB through this strategy. Moreover, this strategy might be further extended to fabricate OHNSs with other worthy functional groups.
What problem does this paper attempt to address?