Silicon nitride directional coupler-based polarization beam splitter utilizing shallow ridge waveguides for improved fabrication tolerance

Po-Hsiang Chiu,Yi-Jia Huang,Yong-Jun Chen,Zi-Xuan Xu,Hsing-Hsiang Wang,Wen-Hsien Huang,Chun-Ta Wang
DOI: https://doi.org/10.1016/j.cjph.2024.10.014
IF: 3.957
2024-10-15
Chinese Journal of Physics
Abstract:Highlights • A polarization beam splitter based on directional couplers was designed. • A wider coupling gap using the shallow ridge waveguide design was achieved. • A polarization beam splitter was fabricated using standard I-line lithography. • The device shows PERs over 20 dB for TE/TM modes across 120 nm. This study presents the design and fabrication of a silicon nitride (Si 3 N 4 ) asymmetrical directional coupler (DC)-based polarization beam splitter (PBS) utilizing a shallow ridge waveguide structure. The use of Si 3 N 4 with a moderate refractive index contrast and the design of a shallow ridge waveguide enables the DC structure to have a wider coupling gap of approximately 600 nm, which can be readily achieved with standard I-line lithography. The simulation results indicate that the polarization splitting is highly efficient with minimal insertion loss. This is corroborated by the experimental measurements, which show consistent broadband performance. The fabricated polarization beam splitter (PBS) exhibits a high polarization extinction ratio (PER) of over 20 dB for both transverse electric (TE) and transverse magnetic (TM) modes across a broad bandwidth of 120 nm (1500-1620 nm). This work demonstrates the potential of shallow ridge Si 3 N 4 waveguides to enhance the fabrication tolerance and performance of integrated photonic devices.
physics, multidisciplinary
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