Optimal Defocus Selection Based on Normed Fourier Transform for Digital Fringe Pattern Profilometry

Abel Kamagara,Xiangzhao Wang,Sikun Li
DOI: https://doi.org/10.1364/ao.56.008014
IF: 1.9
2017-01-01
Applied Optics
Abstract:Owing to gamma-effect robustness and high-speed imaging capabilities, projector defocusing of binary-coded fringe patterns is by far the most widely used and effective technique in generating sinusoidal fringe patterns for three-dimensional optical topography measurement with digital fringe projection techniques. However, this technique is not trouble-free. It is borne with uncertainty and challenges mainly because it remains somewhat difficult to quantify and ascertain the level of defocus required for desired fidelity in sinuousness of the projected fringe pattern. Too much or too little defocusing will affect the sinuosity accuracy of fringe patterns and consequently jeopardize the quality of the measurement results. In this paper, by combining intrinsic phase spectral sensitivities and normed Fourier transform, a method to quantify the amount of defocus and subsequently select the optimal degree of sinuosity for generating digital sinusoidal fringe patterns with projector defocusing for fringe pattern optical three-dimensional profilometry is proposed. Numerical simulations plus experiments give evidence of the feasibility and validity of the proposed method in enabling an improved digital binary defocusing technique for optical phase-shift profilometry using the digital fringe projection technique.
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