Chemical Instability of Graphene Oxide Following Exposure to Highly Reactive Radicals in Advanced Oxidation Processes.

Zhaohui Wang,Linyan Sun,Xiaoyi Lou,Fei Yang,Min Feng,Jianshe Liu
DOI: https://doi.org/10.1016/j.jcis.2017.07.105
IF: 9.9
2017-01-01
Journal of Colloid and Interface Science
Abstract:The rapidly increasing and widespread use of graphene oxide (GO) as catalyst supports, requires further understanding of its chemical stability in advanced oxidation processes (AOPs). In this study, UV/H2O2 and UV/persulfate (UV/PS) processes were selected to test the chemical instability of GO in terms of their performance in producing highly reactive hydroxyl radicals (OH) and sulfate radicals (SO4-), respectively. The degradation intermediates were characterized using UV-visible absorption spectra (UV-vis), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), Raman spectroscopy, and matrix-assisted laser desorption and ionization time-of-flight mass spectrometry (MALDI-TOF-MS). Experimental data indicate that UV/PS process was more effective in enhancing GO degradation than the UV/H2O2 system. The overall oxygen-containing functionalities (e.g. CO, CO and OCO groups) dramatically declined. After radical attack, sheet-like GO was destructed into lots of flakes and some low-molecular-weight molecules were detected. The results suggest GO is most vulnerable against SO4- radical attack, which deserves special attention while GO acts as a catalyst support or even as a catalyst itself. Therefore, stability of GO and its derivatives should be carefully assessed before they are applied to SO4--based AOPs.
What problem does this paper attempt to address?