Interface transition from Ohmic to Schottky contact in Ti3X2/MoS2 (X= B, C, N): Insights from first-principles
Yan Liu,Wendong Zhang,Bohan Lv,Yang Ge,Riguang Zhang,Baojun Wang,Zhihong Chen,Qiang Zhang,Shengbo Sang
DOI: https://doi.org/10.1016/j.surfin.2022.101823
IF: 6.2
2022-06-01
Surfaces and Interfaces
Abstract:Ti3C2 MXene has received tremendous interest as a potential electrode in flexible electronics due to its promising electronic and mechanical properties. However, its inherent properties determine the interfacial performance and the interfacial properties with MoS2 are critical to nanoelectronics device. Based on first-principles calculations, the mechanical properties of Ti3X2 (X= B, C or N) and interfacial properties of Ti3X2/MoS2 by strain are investigated. The Ti3N2 shows advantages in strength and conductivity, and all Ti3X2/MoS2 interfaces exhibit Ohmic contact without tunneling barrier. Furthermore, depending on the nearly disappearing interface hybridization by controlling vertical strain, a transition from Ohmic to Schottky contact occurs. The differences in metal work function and interface dipole potential make the Schottky contact display n-type in Ti3B2/MoS2 and Ti3C2/MoS2, while p-type in Ti3N2/MoS2 until the vertical strain reaches 3.60 Å. Moreover, the increasing vertical strain is accompanied by the rising tunneling barrier, and weak interfacial interaction makes the variation of barrier more sensitive to strain. The results demonstrate that vertical strain is an effective way of controlling metal-semiconductor interface and provide guidance for designing Schottky devices.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films