Pressure-induced Iso-Structural Phase Transition and Metallization in WSe2

Xuefei Wang,Xuliang Chen,Yonghui Zhou,Changyong Park,Chao An,Ying Zhou,Ranran Zhang,Chuanchuan Gu,Wenge Yang,Zhaorong Yang
DOI: https://doi.org/10.1038/srep46694
IF: 4.6
2017-01-01
Scientific Reports
Abstract:We present in situ high-pressure synchrotron X-ray diffraction (XRD) and Raman spectroscopy study, and electrical transport measurement of single crystal WSe2 in diamond anvil cells with pressures up to 54.0–62.8 GPa. The XRD and Raman results show that the phase undergoes a pressure-induced iso-structural transition via layer sliding, beginning at 28.5 GPa and not being completed up to around 60 GPa. The Raman data also reveals a dominant role of the in-plane strain over the out-of plane compression in helping achieve the transition. Consistently, the electrical transport experiments down to 1.8 K reveals a pressure-induced metallization for WSe2 through a broad pressure range of 28.2–61.7 GPa, where a mixed semiconducting and metallic feature is observed due to the coexisting low- and high-pressure structures.
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