Transferred Van Der Waals Metal Electrodes for Sub-1-nm MoS 2 Vertical Transistors
Liting Liu,Lingan Kong,Qianyuan Li,Chenglin He,Liwang Ren,Quanyang Tao,Xiangdong Yang,Jun Lin,Bei Zhao,Zhiwei Li,Yang Chen,Wanying Li,Wenjing Song,Zheyi Lu,Guoli Li,Siyu Li,Xidong Duan,Anlian Pan,Lei Liao,Yuan Liu
DOI: https://doi.org/10.1038/s41928-021-00566-0
IF: 33.255
2021-01-01
Nature Electronics
Abstract:Vertical transistors—in which the channel length is determined by the thickness of the semiconductor—are of interest in the development of next-generation electronic devices. However, short-channel vertical devices are difficult to fabricate, because the high-energy metallization process typically results in damage to the contact region. Here we show that molybdenum disulfide (MoS 2 ) vertical transistors with channel lengths down to one atomic layer can be created using a low-energy van der Waals metal integration technique. The approach uses prefabricated metal electrodes that are mechanically laminated and transferred on top of MoS 2 /graphene vertical heterostructures, leading to vertical field-effect transistors with on–off ratios of 26 and 10 3 for channel lengths of 0.65 nm and 3.60 nm, respectively. Using scanning tunnelling microscopy and low-temperature electrical measurements, we show that the improved electrical performance is the result of a high-quality metal–semiconductor interface, with minimized direct tunnelling current and Fermi-level pinning effect. The approach can also be extended to other layered materials (tungsten diselenide and tungsten disulfide), resulting in sub-3-nm p-type and n-type vertical transistors.