Tellurium‐Assisted Epitaxial Growth of Large‐Area, Highly Crystalline ReS2 Atomic Layers on Mica Substrate

Fangfang Cui,Cong Wang,Xiaobo Li,Gang Wang,Kaiqiang Liu,Zhou Yang,Qingliang Feng,Xing Liang,Zhongyue Zhang,Shengzhong Liu,Zhibin Lei,Zonghuai Liu,Hua Xu,Jin Zhang
DOI: https://doi.org/10.1002/adma.201600722
IF: 29.4
2016-01-01
Advanced Materials
Abstract:Anisotropic 2D layered material rhenium disulfide (ReS2 ) with high crystal quality and uniform monolayer thickness is synthesized by using tellurium-assisted epitaxial growth on mica substrate. Benefit from the lower eutectic temperature of rhenium-tellurium binary eutectic, ReS2 can grow from rhenium (melting point at 3180 °C) and sulfur precursors in the temperature range of 460-900 °C with high efficiency.
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