Photoreduction of nitrogen trifluoride with controlled release of radicals: Photoreduction of nitrogen trifluoride with controlled release of radicals

xingang liu,jiahui zhang,renxi zhang,huiqi hou,shanping chen,yi zhang
DOI: https://doi.org/10.1002/jctb.4136
IF: 3.709
2013-01-01
Journal of Chemical Technology & Biotechnology
Abstract:BACKGROUNDWith the rapid growth of the semiconductor and thin film transistor liquid crystal display manufacturing industries, large quantities of the potent greenhouse gas nitrogen trifluoride (NF3) is in demand. But perfluorocarbons are very stable compounds because of their molecular structures. Therefore, in the atmosphere, NF3 is difficult to oxidize by O-3, NO, NO2, and OH radicals, except by excited oxygen atoms O(D-1) that can react with it to form NF2 or other products. In this study the possible degradation process of NF3 in the controlled release of radicals' reactor is discussed. RESULTSUnder the conditions of 5 mmHg partial pressure of NF3 and 600 mmHg total pressure with buffer gas of argon, NF3 was photodegraded in an in situ reactor with a controlled release of radicals' system. The results indicated that reductive double bonds and allyl radicals, slowly released from polyisoprene irradiated by a UV lamp emitting 185 and 253.7 nm of light, could contribute to the NF3 degradation in the CRR system. The NF3 degradation efficiency, significantly affected by O-2 and almost independent of N-2, reached 96% with a kinetic rate constant k approximate to 1.77 x 10(-4) s(-1) after 300 min of ultraviolet irradiation. CONCLUSIONAccording to the experimental results, a potential way of continuous photoreduction of NF3 was found(,) since excited double bonds and allyl radicals are consequently released by irradiating the surface of the polymer matrix. The considerable degradation reaction constant of NF3 and no fluoride byproducts in gas make it possible for industry application. (c) 2013 Society of Chemical Industry
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