Behavior of Oxidizing Substances on NO Gas Oxidation in Fenton System

Hai Qian Zhao,Ji Hui Gao,Zhong Hua Wang,Shao Hua Wu
DOI: https://doi.org/10.4028/www.scientific.net/amr.1073-1076.764
2014-01-01
Advanced Materials Research
Abstract:There are variety of active substances in Fenton system, such as H2O2, HO2-, O2-·, ·OH and HO2·. In this paper, the oxidation of H2O2, HO2-, O2-·, ·OH and HO2· on NO gas was determined respectively with experimental methods. The results showed that direct oxidation of gaseous NO by H2O2, HO2- and O2-·was weak. ·OH and HO2· had strong oxidizing capacity on gaseous NO, especially ·OH. With the acceleration of ·OH and HO2· generation rate, the oxidizability of Fenton system on NO gas was stronger, but O2 generation rate also accelerated. Rapid decomposition of H2O2 is the premise to realize high NO oxidation efficiency using H2O2, but how to avoid the invalid decomposition of H2O2 is the key to increase use ratio of H2O2.
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