Characterization of Resistive Switching States in W/Pr0.7Ca0.3MnO3for a Submicron (φ250 Nm) Via-Hole Structure

Manzar Siddik,Kuyyadi P. Biju,Xinjun Liu,Joonmyoung Lee,Insung Kim,Seonghyun Kim,Wootae Lee,Seungjae Jung,Daeseok Lee,Sharif Sadaf,Hyunsang Hwang
DOI: https://doi.org/10.1143/jjap.50.105802
IF: 1.5
2011-01-01
Japanese Journal of Applied Physics
Abstract:Analysis of asymmetric current–voltage (I–V) of low resistance state (LRS) and high resistance state (HRS) in a W/Pr0.7Ca0.3MnO3 (PCMO) submicron (φ250 nm) resistive memory device revealed the formation of a Schottky-like contact in both states. Raman spectroscopy analysis was used to measure the concentration of oxygen vacancies in LRS and HRS. A significant intensity difference at ∼610 cm-1 for HRS and LRS indicates that a higher number of oxygen vacancies are created in HRS than in LRS. Based on material analysis, modulation of the oxygen vacancy concentration at the PCMO layer in relation to the redox reaction between W and Mn proposed to be responsible for resistive switching phenomena.
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