Sensitivity enhancement for measurement of nonlinear refraction using top-hat beams

Junyi Yang,Xingzhi Wu,Min Shi,Zhongguo Li,Yong Yang,Yinglin Song
DOI: https://doi.org/10.1007/s00340-012-5308-y
2013-01-01
Applied Physics B
Abstract:A simple and high-sensitivity technique is presented to investigate nonlinear refraction. In this technique, a combination of aperture and obscuration disk is introduced in the measurement system. Compared to the top-hat Z-scan, the curves of modified top-hat Z-scan for the nonlinear refraction show a single peak. Furthermore, the sensitivity of this new technique can be more than two orders of magnitude enhanced. Nonlinear refraction of Nd-doped phosphate glass is investigated using this technique with 19 ps pulses at wavelength of 532 nm.
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