Enhanced Electrochemical Performance of Reduced Graphene Oxides by H2/Ar Plasma Treatment

Jie Li,Changlun Chen,Juan Wei,Jiaxing Li,Xiangke Wang
DOI: https://doi.org/10.1021/jp509182g
2014-01-01
Abstract:Graphene oxides (GOs) were reduced by H2/Ar plasma. Changes in the atom composition and structural properties of reduced GOs (rGOs) were studied as a function of the ratio of H2 to Ar, treatment time, and discharge power by using X-ray photoelectron spectroscopy. The results suggested that the removal of oxygen-containing functional groups and the improvement of electrochemical performance were affected by the ratio of H2 to Ar, treatment time, and discharge power. After plasma treatment, the rGO electrode showed excellent electrochemical stability and an enhanced specific capacitance of 185.2 F g–1 at a scan rate of 100 mV s–1. The present work suggests that H2/Ar plasma treatment provides a reliable method for GO reduction, which can benefit the efficient production of graphene-based electrode materials.
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