Self-assembled graphene oxide thin films deposited by atmospheric pressure plasma and their hydrogen thermal reduction

Marco Antonio Uscanga Olea,José de Jesús Pérez Bueno,Jesús Adrián Díaz Real,Arturo Alonso Mares Suárez,Juan Francisco Pérez Robles,Alejandra Xochitl Maldonado Pérez,Sebastián Yepes Largo
DOI: https://doi.org/10.1016/j.matlet.2024.136334
IF: 3
2024-05-01
Materials Letters
Abstract:This work uses an atmosphere-pressure plasma jet to obtain thin, homogeneous graphene oxide coatings. The films consisted of self-assembled graphene oxide (GO) layers, which were reduced by heat treatment under a reductive hydrogen atmosphere to obtain a reduced graphene oxide film. The electrochemical and photoelectrochemical analyses show that electrical conductivity increases after the reduction process; meanwhile, this process eliminates the p-type photoactivity of the graphene oxide film. The reduced graphene oxide X-ray diffraction pattern revealed the elimination of the signal at 2θ = 11° initially found in the graphene oxide film. The C1s and O1s high-resolution XPS analyses of the reduced graphene oxide film reveal a pronounced increase in the graphitic-like carbon (sp2), whereas a decrease in the organic-like carbon (sp3) and oxygenated species, such as C-OH, C-O-C, CO, and OCOH, initially found in the graphene oxide film.
materials science, multidisciplinary,physics, applied
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