Abstract:In recent years, liquid metal catalysts have emerged as a compelling choice for the controllable, large-scale, and high-quality synthesis of two-dimensional materials. At present, there is little mechanistic understanding of the intricate catalytic process, though, of its governing factors or what renders it superior to growth at the corresponding solid catalysts. Here, we report on a combined experimental and computational study of the kinetics of graphene growth during chemical vapor deposition on a liquid copper catalyst. By monitoring the growing graphene flakes in real time using in situ radiation-mode optical microscopy, we explore the growth morphology and kinetics over a wide range of CH4-to-H2 pressure ratios and deposition temperatures. Constant growth rates of the flakes' radius indicate a growth mode limited by precursor attachment, whereas methane-flux-dependent flake shapes point to limited precursor availability. Large-scale free energy simulations enabled by an efficient machine-learning moment tensor potential trained to density-functional theory data provide quantitative barriers for key atomic-scale growth processes. The wealth of experimental and theoretical data can be consistently combined into a microkinetic model that reveals mixed growth kinetics that, in contrast to the situation at solid Cu, is partly controlled by precursor attachment alongside precursor availability. Key mechanistic aspects that directly point toward the improved graphene quality are a largely suppressed carbon dimer attachment due to the facile incorporation of this precursor species into the liquid surface and a low-barrier ring-opening process that self-heals 5-membered rings resulting from remaining dimer attachments.

Self-Limiting Chemical Vapor Deposition Growth of Monolayer Graphene from Ethanol

Chemical Vapor Deposition Growth of Large Grapheme Single Crystal from Ethanol

CVD Growth of Mono- and Bi-layer Graphene from Ethanol

Equilibrium Chemical Vapor Deposition Growth of Bernal-stacked Bilayer Graphene.

Chemical Vapor Deposition Growth of Large Single-Crystal Bernal-Stacked Bilayer Graphene from Ethanol

Etching-Controlled Growth of Graphene by Chemical Vapor Deposition

Monolayer Graphene Growth Using Additional Etching Process in Atmospheric Pressure Chemical Vapor Deposition

Modeling of the self-limited growth in catalytic chemical vapor deposition of graphene

A Systematic Study of Atmospheric Pressure Chemical Vapor Deposition Growth of Large-Area Monolayer Graphene.

Chemical vapor deposition growth of 5mm hexagonal single-crystal graphene from ethanol

The role of etching on growth of adlayer graphene by chemical vapor deposition

The Efficiency Study of Graphene Synthesis on Copper Substrate via Chemical Vapor Deposition Method with Methanol Precursor

Operando Characterization and Molecular Simulations Reveal the Growth Kinetics of Graphene on Liquid Copper during Chemical Vapor Deposition

Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/Siox by Chemical Vapor Deposition

Graphene thickness control via gas-phase dynamics in chemical vapor deposition

Chemical Vapor Deposition Growth of Graphene using Other Hydrocarbon Sources

Selective Lpcvd Growth of Graphene on Patterned Copper and Its Growth Mechanism

Epitaxial Nucleation of CVD Bilayer Graphene on Copper.

Ultrafast Growth of Uniform Multi-Layer Graphene Films Directly on Silicon Dioxide Substrates

Growth Kinetics of Graphene on Cu(111) Foils from Methane, Ethyne, Ethylene, and Ethane

Step Driven Competitive Epitaxial and Self-Limited Growth of Graphene on Copper Surface