Abstract:Block copolymer lithography, an alternative lithographic technique by which self-assembled patterns made from block copolymer thin films are used as lithographic masks, has achieved a high enough level of maturity to be considered for nanofabrication in magnetic recording bit patterned media and in some applications in the semiconductor industry. As the demand for lithographic dimensions squeezes into the single-digit nm scale, pairing block copolymer materials that segregate at these dimensions with adequate pattern transfer techniques is increasingly difficult. For example, PS-b-PMMA, the most mature block copolymer system can only form line/space patterns with pattern transfer above 10 nm. Other promising materials like P2VP-PS-P2VP triblocks, however, lack sufficient etch contrast for reactive ion etching. Here, we present a nanofabrication strategy that integrates atomic layer deposition, ALD, with block copolymer lithography to enable fabrication of sub-10nm features for high density magnetic storage. The selective, cyclic and self-terminating nature of the materials synthesis within ALD reactors provides powerful nanofabrication tools. In particular, two of these tools stand out as enablers for high density patterning: First, the chemical selectivity of the organometallic precursors has facilitated selective synthesis inside porous polymeric materials. Second, the conformality afforded by the self-terminating nature of the ALD reactions has proven to be ideally suited for feature doubling in self-aligned double patterning, SADP. Integrating these powerful tools with block copolymer lithography opens new possibilities in two fronts: On the one hand, it is possible to generate hybrid nanocomposites with nanometer-scale resolution and high etching contrast. This is particularly useful for high resolution block copolymer materials for which no natural etch contrast exists such as P2VP-PS-P2VP triblocks. On the other hand, it is possible to use the already sub-lithographic features obtained by standard PS-b-PMMA block copolymer lithography as the starting point for an additional density multiplication using spacer lines grown by ALD for SADP. Be it for selective infiltration synthesis in block copolymer patterns or for the precise conformal growth in nanostructures made from block copolymers, ALD is likely to emerge as an ideal complimentary technique to block copolymer self assembly to enable sub-10nm lithography.

Sub-10-nm-resolution Electron-Beam Lithography Toward Very-High-density Multilevel 3D Nano-Magnetic Information Devices

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Two-photon lithography for 3D magnetic nanostructure fabrication

Toward 1Tdot∕in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges

Combining two-photon lithography with laser ablation of sacrificial layers: A route to isolated 3D magnetic nanostructures

Magnetic Resonance Lithography with Nanometer Resolution

Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography

Fabrication of Ultrafine L10-FePt-Based Magnetic Patterns Enabled by Single-Step Nanoimprint-Assisted Block Copolymer Self-Assembly.

Off-axis electron holography for the direct visualization of perpendicular shape anisotropy in nano-scale 3D magnetic random-access-memory devices

High-aspect-ratio Nanoimprinted Structures for a Multi-Pole Magnetic Scale

Beam Pen Lithography.

Enabling Sub-10nm Lithography with Atomic Layer Deposition and Block Copolymer Self Assembly

Long Range Ordering of 5-nm-Sized Dot Arrays with a Pitch of <10 nm along EB-Drawn Guide Lines Using PS-PDMS Self-Assembly

Fabrication of Ferromagnetic Nanoconstrictions by Electron Beam Lithography Using LOR/PMMA Bilayer Technique

Stable ultrahigh-density magneto-optical recordings using introduced linear defects

5 Nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography.

Using single and double laser pulses on the molecular Ni 4 @C 48 H 36 system to design integrated nanospintronic units

Fabrication of Ultrafine L1 0 -FePt-Based Magnetic Patterns Enabled by Single-Step Nanoimprint-Assisted Block Copolymer Self-Assembly

Nanofabricated high turn-density spiral coils for on-chip electromagneto-optical conversion

Three-Dimensional Magnetic Page Memory

Two-bit Storage Recording Head Based on the Magnetic Thin Film Device