Selective adsorption of catalyst and copper plating for additive fabrication of conductive patterns and through-holes

yu chang,yu tao,qun zhang,zhenguo yang
DOI: https://doi.org/10.1016/j.electacta.2015.01.161
IF: 6.6
2015-01-01
Electrochimica Acta
Abstract:•A process to additively fabricate copper patterns and through-holes was developed.•The polysilxane with amino and mercapto groups which can adsorb catalytic ion was prepared.•Special solvent used in the polysixane ink can increase the adhesion of copper patterns.
What problem does this paper attempt to address?