Restoration of Graphene from Graphene Oxide by Defect Repair

Meng Cheng,Rong Yang,Lianchang Zhang,Zhiwen Shi,Wei Yang,Duoming Wang,Guibai Xie,Dongxia Shi,Guangyu Zhang
DOI: https://doi.org/10.1016/j.carbon.2012.02.016
IF: 10.9
2012-01-01
Carbon
Abstract:A simple and efficient method to repair defects in graphene oxide (GO) is reported, accompanied by a simultaneous reduction process by a methane plasma. The graphene after repair is of high quality. For a typical monolayer after repair and reduction, the minimum sheet resistance at the Dirac point and the Raman D/G peak intensity ratio are about 9.0kΩ/□ and ∼0.53, respectively.
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