The effect of Cu doping concentration on resistive switching of HfO 2 film

tingting guo,tingting tan,zhengtang liu
DOI: https://doi.org/10.1016/j.apsusc.2015.05.176
IF: 6.7
2015-01-01
Applied Surface Science
Abstract:•The Cu doped and undoped HfO2 films were fabricated.•The improved RS behaviors were observed for Cu doped HfO2 film with BRS.•The 9.7% doped HfO2:Cu film showed both BRS and URS behaviors.•The related switching mechanisms were illustrated.
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